Synthetic fused silica is an ultra-high purity form of silicon dioxide (SiO₂), produced through chemical vapor deposition rather than melting natural quartz. This manufacturing process yields material with extremely low levels of impurities, especially metallic contaminants. Synthetic fused silica is ideal for the most demanding optical and semiconductor applications.
Fused silica is recognized for exceptional transparency in the spectral wavelength range from deep ultraviolet (DUV) to infrared (IR). Prominent characteristics include excellent thermal stability, low thermal expansion, plus superior resistance to radiation and chemical attack. Consistent quality and optical homogeneity make synthetic fused silica a choice material to enhance performance and satisfy critical purity specifications.
Grade QL630: Synthetic Fused Silica
Applications:
Photolithography, laser systems, fiber optics, and high-precision optical components. QL630 Grade is also widely used as critical quartz components for semiconductor industry.
Fabrication:
Extensive capabilities include polishing, drilling & cutting, custom geometries, CNC machining for slots, holes, recesses, etc.
Sizes:
Available in standard, custom, and large sizes of up to a measurement of 24" diameter.